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题名: Unique reactivity of confined metal atoms on a silicon substrate
作者: Yao, Yun-Xi1;  Liu, Xin1, 2;  Fu, Qiang1;  Li, Wei-Xue1, 2;  Tan, Da-Li1;  Bao, Xin-He1
通讯作者: 傅强 ;  李微雪 ;  包信和
关键词: chemisorption ;  confinement effects ;  density functional calculations ;  photoemission electron microscopy ;  size effects
刊名: CHEMPHYSCHEM
发表日期: 2008-05-02
DOI: 10.1002/cphc.200700840
卷: 9, 期:7, 页:975-979
收录类别: SCI
文章类型: Article
部门归属: 5
项目归属: 502,507
产权排名: 1;1
WOS标题词: Science & Technology ;  Physical Sciences
类目[WOS]: Chemistry, Physical ;  Physics, Atomic, Molecular & Chemical
研究领域[WOS]: Chemistry ;  Physics
关键词[WOS]: X-RAY-DIFFRACTION ;  BOND FORMATION ;  SURFACE ;  ADSORPTION ;  CATALYSIS ;  AG(111)
语种: 英语
原文出处: 查看原文
WOS记录号: WOS:000255845500003
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/100273
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China
2.Chinese Acad Sci, Dalian Inst Chem Phys, Ctr Theoret & Computat Chem, Dalian 116023, Peoples R China

Recommended Citation:
Yao, Yun-Xi,Liu, Xin,Fu, Qiang,et al. Unique reactivity of confined metal atoms on a silicon substrate[J]. CHEMPHYSCHEM,2008,9(7):975-979.
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