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Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface
Zhang, Zhen; Jiang, Zhiquan; Yao, Yunxi; Tan, Dali; Fu, Qiang; Bao, Xinhe; Bao XH(包信和); Bao XH(包信和)
关键词Silica Films Metal-oxide Interfaces X-ray Photoelectron Spectroscopy Ultraviolet Photoelectron Spectroscopy High-resolution Electron Energy Loss Spectroscopy Scanning Tunneling Microscopy
刊名THIN SOLID FILMS
2008-04-30
DOI10.1016/j.tsf.2007.06.070
516期:12页:3741-3746
收录类别SCI
文章类型Article
部门归属5
项目归属502
产权排名1;1
WOS标题词Science & Technology ; Technology ; Physical Sciences
类目[WOS]Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
研究领域[WOS]Materials Science ; Physics
关键词[WOS]SIO2 THIN-FILMS ; DIOXIDE FILMS ; INITIAL-STAGES ; GROWTH ; XPS ; SPECTROSCOPY ; CRYSTALLINE ; MO(112) ; PHOTOEMISSION ; INTERFACE
英文摘要Ultrathin silica films with different thicknesses have been gown on a Pd(100) surface by depositing silicon in the presence Of O-2. The film composition and electronic properties were characterized by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and high-resolution electron energy loss spectroscopy (HREELS). Scanning tunneling microscopy was applied to investigate the film morphology and lattice structure. The results show that the obtained films are atomically flat and highly ordered in a long range. UPS and HREELS measurements indicate that the silica film has the same electronic and vibrational properties as bulk silica. A 2.8 nm thick film exhibits low defects in the film and high thermal stability up to 800 K, as evidenced by ion scattering spectroscopy and XPS. (c) 2007 Elsevier B.V. All rights reserved.
语种英语
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WOS记录号WOS:000255125900004
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被引频次:23[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/100579
专题中国科学院大连化学物理研究所
通讯作者Bao XH(包信和); Bao XH(包信和)
作者单位Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China
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Zhang, Zhen,Jiang, Zhiquan,Yao, Yunxi,et al. Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface[J]. THIN SOLID FILMS,2008,516(12):3741-3746.
APA Zhang, Zhen.,Jiang, Zhiquan.,Yao, Yunxi.,Tan, Dali.,Fu, Qiang.,...&包信和.(2008).Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface.THIN SOLID FILMS,516(12),3741-3746.
MLA Zhang, Zhen,et al."Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface".THIN SOLID FILMS 516.12(2008):3741-3746.
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