DICP OpenIR
Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface
Zhang, Zhen; Jiang, Zhiquan; Yao, Yunxi; Tan, Dali; Fu, Qiang; Bao, Xinhe; Bao XH(包信和); Bao XH(包信和)
KeywordSilica Films Metal-oxide Interfaces X-ray Photoelectron Spectroscopy Ultraviolet Photoelectron Spectroscopy High-resolution Electron Energy Loss Spectroscopy Scanning Tunneling Microscopy
Source PublicationTHIN SOLID FILMS
2008-04-30
DOI10.1016/j.tsf.2007.06.070
Volume516Issue:12Pages:3741-3746
Indexed BySCI
SubtypeArticle
Department5
Funding Project502
Contribution Rank1;1
WOS HeadingsScience & Technology ; Technology ; Physical Sciences
WOS SubjectMaterials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
WOS Research AreaMaterials Science ; Physics
WOS KeywordSIO2 THIN-FILMS ; DIOXIDE FILMS ; INITIAL-STAGES ; GROWTH ; XPS ; SPECTROSCOPY ; CRYSTALLINE ; MO(112) ; PHOTOEMISSION ; INTERFACE
AbstractUltrathin silica films with different thicknesses have been gown on a Pd(100) surface by depositing silicon in the presence Of O-2. The film composition and electronic properties were characterized by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and high-resolution electron energy loss spectroscopy (HREELS). Scanning tunneling microscopy was applied to investigate the film morphology and lattice structure. The results show that the obtained films are atomically flat and highly ordered in a long range. UPS and HREELS measurements indicate that the silica film has the same electronic and vibrational properties as bulk silica. A 2.8 nm thick film exhibits low defects in the film and high thermal stability up to 800 K, as evidenced by ion scattering spectroscopy and XPS. (c) 2007 Elsevier B.V. All rights reserved.
Language英语
URL查看原文
WOS IDWOS:000255125900004
Citation statistics
Cited Times:27[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/100579
Collection中国科学院大连化学物理研究所
Corresponding AuthorBao XH(包信和); Bao XH(包信和)
AffiliationChinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China
Recommended Citation
GB/T 7714
Zhang, Zhen,Jiang, Zhiquan,Yao, Yunxi,et al. Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface[J]. THIN SOLID FILMS,2008,516(12):3741-3746.
APA Zhang, Zhen.,Jiang, Zhiquan.,Yao, Yunxi.,Tan, Dali.,Fu, Qiang.,...&包信和.(2008).Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface.THIN SOLID FILMS,516(12),3741-3746.
MLA Zhang, Zhen,et al."Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface".THIN SOLID FILMS 516.12(2008):3741-3746.
Files in This Item:
There are no files associated with this item.
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Zhang, Zhen]'s Articles
[Jiang, Zhiquan]'s Articles
[Yao, Yunxi]'s Articles
Baidu academic
Similar articles in Baidu academic
[Zhang, Zhen]'s Articles
[Jiang, Zhiquan]'s Articles
[Yao, Yunxi]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Zhang, Zhen]'s Articles
[Jiang, Zhiquan]'s Articles
[Yao, Yunxi]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.