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题名: Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface
作者: Zhang, Zhen1;  Jiang, Zhiquan1;  Yao, Yunxi1;  Tan, Dali1;  Fu, Qiang1;  Bao, Xinhe1
通讯作者: 包信和
关键词: silica films ;  metal-oxide interfaces ;  X-ray photoelectron spectroscopy ;  ultraviolet photoelectron spectroscopy ;  high-resolution electron energy loss spectroscopy ;  scanning tunneling microscopy
刊名: THIN SOLID FILMS
发表日期: 2008-04-30
DOI: 10.1016/j.tsf.2007.06.070
卷: 516, 期:12, 页:3741-3746
收录类别: SCI
文章类型: Article
部门归属: 5
项目归属: 502
产权排名: 1;1
WOS标题词: Science & Technology ;  Technology ;  Physical Sciences
类目[WOS]: Materials Science, Multidisciplinary ;  Materials Science, Coatings & Films ;  Physics, Applied ;  Physics, Condensed Matter
研究领域[WOS]: Materials Science ;  Physics
英文摘要: Ultrathin silica films with different thicknesses have been gown on a Pd(100) surface by depositing silicon in the presence Of O-2. The film composition and electronic properties were characterized by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and high-resolution electron energy loss spectroscopy (HREELS). Scanning tunneling microscopy was applied to investigate the film morphology and lattice structure. The results show that the obtained films are atomically flat and highly ordered in a long range. UPS and HREELS measurements indicate that the silica film has the same electronic and vibrational properties as bulk silica. A 2.8 nm thick film exhibits low defects in the film and high thermal stability up to 800 K, as evidenced by ion scattering spectroscopy and XPS. (c) 2007 Elsevier B.V. All rights reserved.
关键词[WOS]: SIO2 THIN-FILMS ;  DIOXIDE FILMS ;  INITIAL-STAGES ;  GROWTH ;  XPS ;  SPECTROSCOPY ;  CRYSTALLINE ;  MO(112) ;  PHOTOEMISSION ;  INTERFACE
语种: 英语
原文出处: 查看原文
WOS记录号: WOS:000255125900004
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/100579
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China

Recommended Citation:
Zhang, Zhen,Jiang, Zhiquan,Yao, Yunxi,et al. Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface[J]. THIN SOLID FILMS,2008,516(12):3741-3746.
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