DICP OpenIR
溶剂对DMFC阴极催化层微观结构的影响
叶瑷玮; 孙公权; 王素力
Source Publication电源技术
2009
Pages94-97
Department3
Funding Project305
Contribution Rank1;1
Language
URL查看原文
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/102427
Collection中国科学院大连化学物理研究所
Corresponding Author孙公权
Recommended Citation
GB/T 7714
叶瑷玮,孙公权,王素力. 溶剂对DMFC阴极催化层微观结构的影响[J]. 电源技术,2009:94-97.
APA 叶瑷玮,孙公权,&王素力.(2009).溶剂对DMFC阴极催化层微观结构的影响.电源技术,94-97.
MLA 叶瑷玮,et al."溶剂对DMFC阴极催化层微观结构的影响".电源技术 (2009):94-97.
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