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A simple photolithography method for microfluidic device fabrication using sunlight as UV source
Ma, Jingyun; Jiang, Lei; Pan, Xiaoyan; Ma, Huipeng; Lin, Bingcheng; Qin, Jianhua; Qin JH(秦建华)
关键词Microfabrication Photolithography Sunlight-photolithography
刊名MICROFLUIDICS AND NANOFLUIDICS
2010-12-01
DOI10.1007/s10404-010-0630-3
9期:6页:1247-1252
收录类别SCI
文章类型Article
部门归属18
项目归属1807
产权排名1;1
WOS标题词Science & Technology ; Technology ; Physical Sciences
类目[WOS]Nanoscience & Nanotechnology ; Instruments & Instrumentation ; Physics, Fluids & Plasmas
研究领域[WOS]Science & Technology - Other Topics ; Instruments & Instrumentation ; Physics
英文摘要A straightforward method for microfluidic devices fabrication using sunlight as the ultraviolet (UV) source is established in this work. This method is based on photolithography, but obviates the need for specialized UV exposure facility. Substrates coated with photoresist were placed directly under sun in a perpendicular direction to the sunlight for exposure. Exposure conditions were optimized for patterning features with different kinds of photoresist, photoresist of different thicknesses and dimensions. Exposure time can be adjusted to obtain designed features on a mask with good lateral structure according to the energy measured by UV meter (with a constant intensity of UV in sunlight). Masters produced under optimum exposure conditions were used for the fabrication of several microfluidic devices with different materials, structures, or functions. Resultant devices were shown eminently suitable for microfluidic applications such as electrophoretic separation, multiple gradient generator, and pneumatic valve-based cell culture. This photolithographic method is simple, low cost, easy to operate, and environmental friendly. Especially, the masters can be obtained in parallel simultaneously, which is suitable for chip fabrication for mass production. It is also more attractive for the laboratories, in which the support for photolithographic facility is not available.
语种英语
原文出处查看原文
WOS记录号WOS:000284335800020
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被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/103431
专题中国科学院大连化学物理研究所
通讯作者Qin JH(秦建华)
作者单位Chinese Acad Sci, Dalian Inst Chem Phys, Dalian, Peoples R China
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GB/T 7714
Ma, Jingyun,Jiang, Lei,Pan, Xiaoyan,et al. A simple photolithography method for microfluidic device fabrication using sunlight as UV source[J]. MICROFLUIDICS AND NANOFLUIDICS,2010,9(6):1247-1252.
APA Ma, Jingyun.,Jiang, Lei.,Pan, Xiaoyan.,Ma, Huipeng.,Lin, Bingcheng.,...&秦建华.(2010).A simple photolithography method for microfluidic device fabrication using sunlight as UV source.MICROFLUIDICS AND NANOFLUIDICS,9(6),1247-1252.
MLA Ma, Jingyun,et al."A simple photolithography method for microfluidic device fabrication using sunlight as UV source".MICROFLUIDICS AND NANOFLUIDICS 9.6(2010):1247-1252.
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