中国科学院大连化学物理研究所机构知识库
Advanced  
DICP OpenIR  > 中国科学院大连化学物理研究所  > 期刊论文
题名: A simple photolithography method for microfluidic device fabrication using sunlight as UV source
作者: Ma, Jingyun1;  Jiang, Lei1;  Pan, Xiaoyan1;  Ma, Huipeng1;  Lin, Bingcheng1;  Qin, Jianhua1
通讯作者: 秦建华
关键词: Microfabrication ;  Photolithography ;  Sunlight-photolithography
刊名: MICROFLUIDICS AND NANOFLUIDICS
发表日期: 2010-12-01
DOI: 10.1007/s10404-010-0630-3
卷: 9, 期:6, 页:1247-1252
收录类别: SCI
文章类型: Article
部门归属: 18
项目归属: 1807
产权排名: 1;1
WOS标题词: Science & Technology ;  Technology ;  Physical Sciences
类目[WOS]: Nanoscience & Nanotechnology ;  Instruments & Instrumentation ;  Physics, Fluids & Plasmas
研究领域[WOS]: Science & Technology - Other Topics ;  Instruments & Instrumentation ;  Physics
英文摘要: A straightforward method for microfluidic devices fabrication using sunlight as the ultraviolet (UV) source is established in this work. This method is based on photolithography, but obviates the need for specialized UV exposure facility. Substrates coated with photoresist were placed directly under sun in a perpendicular direction to the sunlight for exposure. Exposure conditions were optimized for patterning features with different kinds of photoresist, photoresist of different thicknesses and dimensions. Exposure time can be adjusted to obtain designed features on a mask with good lateral structure according to the energy measured by UV meter (with a constant intensity of UV in sunlight). Masters produced under optimum exposure conditions were used for the fabrication of several microfluidic devices with different materials, structures, or functions. Resultant devices were shown eminently suitable for microfluidic applications such as electrophoretic separation, multiple gradient generator, and pneumatic valve-based cell culture. This photolithographic method is simple, low cost, easy to operate, and environmental friendly. Especially, the masters can be obtained in parallel simultaneously, which is suitable for chip fabrication for mass production. It is also more attractive for the laboratories, in which the support for photolithographic facility is not available.
语种: 英语
原文出处: 查看原文
WOS记录号: WOS:000284335800020
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/103431
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

Files in This Item:

There are no files associated with this item.


作者单位: 1.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian, Peoples R China

Recommended Citation:
Ma, Jingyun,Jiang, Lei,Pan, Xiaoyan,et al. A simple photolithography method for microfluidic device fabrication using sunlight as UV source[J]. MICROFLUIDICS AND NANOFLUIDICS,2010,9(6):1247-1252.
Service
 Recommend this item
 Sava as my favorate item
 Show this item's statistics
 Export Endnote File
Google Scholar
 Similar articles in Google Scholar
 [Ma, Jingyun]'s Articles
 [Jiang, Lei]'s Articles
 [Pan, Xiaoyan]'s Articles
CSDL cross search
 Similar articles in CSDL Cross Search
 [Ma, Jingyun]‘s Articles
 [Jiang, Lei]‘s Articles
 [Pan, Xiaoyan]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
  Add to CiteULike  Add to Connotea  Add to Del.icio.us  Add to Digg  Add to Reddit 
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Powered by CSpace