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A simple photolithography method for microfluidic device fabrication using sunlight as UV source
Ma, Jingyun; Jiang, Lei; Pan, Xiaoyan; Ma, Huipeng; Lin, Bingcheng; Qin, Jianhua; Qin JH(秦建华)
KeywordMicrofabrication Photolithography Sunlight-photolithography
Source PublicationMICROFLUIDICS AND NANOFLUIDICS
2010-12-01
DOI10.1007/s10404-010-0630-3
Volume9Issue:6Pages:1247-1252
Indexed BySCI
SubtypeArticle
Department18
Funding Project1807
Contribution Rank1;1
WOS HeadingsScience & Technology ; Technology ; Physical Sciences
WOS SubjectNanoscience & Nanotechnology ; Instruments & Instrumentation ; Physics, Fluids & Plasmas
WOS Research AreaScience & Technology - Other Topics ; Instruments & Instrumentation ; Physics
AbstractA straightforward method for microfluidic devices fabrication using sunlight as the ultraviolet (UV) source is established in this work. This method is based on photolithography, but obviates the need for specialized UV exposure facility. Substrates coated with photoresist were placed directly under sun in a perpendicular direction to the sunlight for exposure. Exposure conditions were optimized for patterning features with different kinds of photoresist, photoresist of different thicknesses and dimensions. Exposure time can be adjusted to obtain designed features on a mask with good lateral structure according to the energy measured by UV meter (with a constant intensity of UV in sunlight). Masters produced under optimum exposure conditions were used for the fabrication of several microfluidic devices with different materials, structures, or functions. Resultant devices were shown eminently suitable for microfluidic applications such as electrophoretic separation, multiple gradient generator, and pneumatic valve-based cell culture. This photolithographic method is simple, low cost, easy to operate, and environmental friendly. Especially, the masters can be obtained in parallel simultaneously, which is suitable for chip fabrication for mass production. It is also more attractive for the laboratories, in which the support for photolithographic facility is not available.
Language英语
URL查看原文
WOS IDWOS:000284335800020
Citation statistics
Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/103431
Collection中国科学院大连化学物理研究所
Corresponding AuthorQin JH(秦建华)
AffiliationChinese Acad Sci, Dalian Inst Chem Phys, Dalian, Peoples R China
Recommended Citation
GB/T 7714
Ma, Jingyun,Jiang, Lei,Pan, Xiaoyan,et al. A simple photolithography method for microfluidic device fabrication using sunlight as UV source[J]. MICROFLUIDICS AND NANOFLUIDICS,2010,9(6):1247-1252.
APA Ma, Jingyun.,Jiang, Lei.,Pan, Xiaoyan.,Ma, Huipeng.,Lin, Bingcheng.,...&秦建华.(2010).A simple photolithography method for microfluidic device fabrication using sunlight as UV source.MICROFLUIDICS AND NANOFLUIDICS,9(6),1247-1252.
MLA Ma, Jingyun,et al."A simple photolithography method for microfluidic device fabrication using sunlight as UV source".MICROFLUIDICS AND NANOFLUIDICS 9.6(2010):1247-1252.
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