Subject Area物理化学
Unique reactivity of confined metal atoms on silicon substrate
Yao YX(姚运喜); Liu X(刘新); Fu Q(傅强); Li WX(李微雪); Tan DL(谭大力); Bao XH(包信和); Xin-He Bao
Conference Name14th International Congress on Catalysis
Conference Date2008-7-13
Conference Placekorea
Funding OrganizationInternational Association of Catalysis Societies and the Korean Institute of Chemical Engineers
AbstractWhen small metal assembles such as single atoms or small clusters consisting of a few atoms are supported on the semiconducting or oxide substrates, the sp electrons in the metal can be confined by the metal-substrate interface, which may be critical to surface reactivity. To shed lights on the electron confinement effect, in particular the sp electron confinement, in supported metal atoms and its effect on the catalytic activity, we report here a comparative reactivity study of bulk Ag(111) surface and a Ag monolayer film on Si(111) surface by means of scanning tunneling microscopy (STM), ultraviolet and X-ray photoelectron spectroscopy (UPS and XPS), photoemission electron microscopy (PEEM), and density functional theory (DFT) calculations. Ag deposited on Si(111) can form a stable periodic array of Ag atoms confined in a 2D Ag monolayer film on Si(111) with the (√3×√3) symmetry. The most simple halogen methane, CCl4, was chosen as the probe molecule to study the surface chemistry of the Ag surfaces due to the high activity of halogen towards Ag. Our study shows that these two surfaces present distinct reactivity towards CCl4 dissociation. Monolayer Ag is inert toward dissociation of CCl4 compared to bulk Ag. Specifically, it is found that confinement of 5sp electron of Ag atoms in the √3×√3-Ag-Si surface, which is delocalized in the bulk Ag(111) surface, is decisive to the different reactivity.
Document Type会议论文
Corresponding AuthorXin-He Bao
Recommended Citation
GB/T 7714
Yao YX,Liu X,Fu Q,et al. Unique reactivity of confined metal atoms on silicon substrate[C],2008:347/1.
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