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学科主题物理化学
Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating
Zhang Min1,2; Hu Xiao-gang1; Yang Xiao-xu1; Xu Fei-fei1; Kim, Kwang-ho3; Shao Zhi-gang2; Zhang M(张敏); KwangHoKIM
关键词Zirconium Nitride (Zrn) Thin Film Arc Ion Plating Substrate Bias Microstructure
刊名TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA
2012-10-01
22页:S115-S119
收录类别SCI
文章类型Article
部门归属DNL03
项目归属DNL0301
产权排名2,1
WOS标题词Science & Technology ; Technology
类目[WOS]Metallurgy & Metallurgical Engineering
研究领域[WOS]Metallurgy & Metallurgical Engineering
关键词[WOS]MECHANICAL-PROPERTIES ; COATINGS ; HARDNESS ; VOLTAGE
英文摘要Zirconium nitride thin films were fabricated using arc ion plating under negative substrate biases to investigate the influence of substrate bias on the ZrN films. The phase, composition, and surface morphology of the ZrN films, with respect to substrate bias, were studied by XRD, EPMA, and FE-SEM, respectively. The results show that cubic ZrN and hexagonal Zr phases form in the ZrN films. The competition between surface energy and strain energy makes the preferred orientation change from (111) to (200) and then back to highly (111) preferred orientation as a function of substrate bias. With the increase of bias voltage, the crystallite size of ZrN films reduces from 30 to 15 nm. Meanwhile, the film microstructure evolves from an apparent columnar structure to a highly dense equiaxed structure, indicating that the ion bombardment enhanced by substrate bias can suppress the columnar growth in the ZrN films. Deposition rate and mole ratio of Zr to N increase with the increase of bias voltage and reach the maximum at -50 V, and then show a decline trend when bias voltage further increases.
语种英语
WOS记录号WOS:000310567300020
引用统计
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/117849
专题中国科学院大连化学物理研究所
通讯作者Zhang M(张敏); KwangHoKIM
作者单位1.Liaoning Normal Univ, Sch Phys & Elect Technol, Dalian 116029, Peoples R China
2.Chinese Acad Sci, Dalian Inst Chem Phys, Fuel Cell Syst & Engn Lab, Dalian 116023, Peoples R China
3.Pusan Natl Univ, Sch Mat Sci & Engn, Pusan 609735, South Korea
推荐引用方式
GB/T 7714
Zhang Min,Hu Xiao-gang,Yang Xiao-xu,et al. Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating[J]. TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA,2012,22:S115-S119.
APA Zhang Min.,Hu Xiao-gang.,Yang Xiao-xu.,Xu Fei-fei.,Kim, Kwang-ho.,...&KwangHoKIM.(2012).Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating.TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA,22,S115-S119.
MLA Zhang Min,et al."Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating".TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA 22(2012):S115-S119.
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