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学科主题: 物理化学
题名: Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating
作者: Zhang Min1, 2;  Hu Xiao-gang1;  Yang Xiao-xu1;  Xu Fei-fei1;  Kim, Kwang-ho3;  Shao Zhi-gang2
通讯作者: 张敏 ;  KwangHoKIM
关键词: zirconium nitride (ZrN) ;  thin film ;  arc ion plating ;  substrate bias ;  microstructure
刊名: TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA
发表日期: 2012-10-01
卷: 22, 页:S115-S119
收录类别: SCI
文章类型: Article
部门归属: DNL03
项目归属: DNL0301
产权排名: 2,1
WOS标题词: Science & Technology ;  Technology
类目[WOS]: Metallurgy & Metallurgical Engineering
研究领域[WOS]: Metallurgy & Metallurgical Engineering
英文摘要: Zirconium nitride thin films were fabricated using arc ion plating under negative substrate biases to investigate the influence of substrate bias on the ZrN films. The phase, composition, and surface morphology of the ZrN films, with respect to substrate bias, were studied by XRD, EPMA, and FE-SEM, respectively. The results show that cubic ZrN and hexagonal Zr phases form in the ZrN films. The competition between surface energy and strain energy makes the preferred orientation change from (111) to (200) and then back to highly (111) preferred orientation as a function of substrate bias. With the increase of bias voltage, the crystallite size of ZrN films reduces from 30 to 15 nm. Meanwhile, the film microstructure evolves from an apparent columnar structure to a highly dense equiaxed structure, indicating that the ion bombardment enhanced by substrate bias can suppress the columnar growth in the ZrN films. Deposition rate and mole ratio of Zr to N increase with the increase of bias voltage and reach the maximum at -50 V, and then show a decline trend when bias voltage further increases.
关键词[WOS]: MECHANICAL-PROPERTIES ;  COATINGS ;  HARDNESS ;  VOLTAGE
语种: 英语
WOS记录号: WOS:000310567300020
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/117849
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Liaoning Normal Univ, Sch Phys & Elect Technol, Dalian 116029, Peoples R China
2.Chinese Acad Sci, Dalian Inst Chem Phys, Fuel Cell Syst & Engn Lab, Dalian 116023, Peoples R China
3.Pusan Natl Univ, Sch Mat Sci & Engn, Pusan 609735, South Korea

Recommended Citation:
Zhang Min,Hu Xiao-gang,Yang Xiao-xu,et al. Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating[J]. TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA,2012,22:S115-S119.
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