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学科主题: 物理化学
题名: Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films
作者: Cheng, Shimin1, 2, 3;  Gao, Huiping1, 2;  Ren, Tong1, 2;  Ying, Pinliang1, 2;  Li, Can1, 2
通讯作者: 李灿
关键词: Silicon ;  Thin films ;  Catalytic chemical vapor deposition ;  Carbonized tantalum ;  Catalyst ageing ;  X-ray diffraction ;  Raman spectroscopy
刊名: THIN SOLID FILMS
发表日期: 2012-06-01
DOI: 10.1016/j.tsf.2012.03.129
卷: 520, 期:16, 页:5155-5160
收录类别: SCI
文章类型: Article
部门归属: 5
项目归属: 503
产权排名: 1,1
WOS标题词: Science & Technology ;  Technology ;  Physical Sciences
类目[WOS]: Materials Science, Multidisciplinary ;  Materials Science, Coatings & Films ;  Physics, Applied ;  Physics, Condensed Matter
研究领域[WOS]: Materials Science ;  Physics
英文摘要: Catalytic chemical vapor deposition (Cat-CVD) has been demonstrated as a promising way to prepare device-quality silicon films. However, catalyst ageing due to Si contamination is an urgency to be solved for the practical application of the technique. In this study, the effect of carbonization of tantalum catalyst on its structure and performance was investigated. The carbonized Ta catalyst has a TaC surface layer which is preserved over the temperature range between 1450 and 1750 degrees C and no Si contamination occurs on the catalyst after long-term use. Si film prepared using the carbonized Ta catalyst has a similar crystal structure to that prepared by uncarbonized Ta catalyst. Formation of the TaC surface layer can alleviate the ageing problem of the catalyst, which shows great potential as a stable catalyst for Cat-CVD of Si films. (C) 2012 Published by Elsevier B.V.
关键词[WOS]: HOT-WIRE CVD ;  HYDROGENATED AMORPHOUS-SILICON ;  A-SI-H ;  CAT-CVD ;  POLYCRYSTALLINE SILICON ;  DIAMOND DEPOSITION ;  TUNGSTEN CATALYZER ;  DEVICE-QUALITY ;  SOLAR-CELLS ;  THIN-FILM
语种: 英语
WOS记录号: WOS:000305719000008
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/117873
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China
2.Dalian Natl Lab Clean Energy, Dalian 116023, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China

Recommended Citation:
Cheng, Shimin,Gao, Huiping,Ren, Tong,et al. Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films[J]. THIN SOLID FILMS,2012,520(16):5155-5160.
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