DICP OpenIR
Subject Area物理化学
Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films
Cheng, Shimin1,2,3; Gao, Huiping1,2; Ren, Tong1,2; Ying, Pinliang1,2; Li, Can1,2; Li C(李灿)
KeywordSilicon Thin Films Catalytic Chemical Vapor Deposition Carbonized Tantalum Catalyst Ageing X-ray Diffraction Raman Spectroscopy
Source PublicationTHIN SOLID FILMS
2012-06-01
DOI10.1016/j.tsf.2012.03.129
Volume520Issue:16Pages:5155-5160
Indexed BySCI
SubtypeArticle
Department5
Funding Project503
Contribution Rank1,1
WOS HeadingsScience & Technology ; Technology ; Physical Sciences
WOS SubjectMaterials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
WOS Research AreaMaterials Science ; Physics
WOS KeywordHOT-WIRE CVD ; HYDROGENATED AMORPHOUS-SILICON ; A-SI-H ; CAT-CVD ; POLYCRYSTALLINE SILICON ; DIAMOND DEPOSITION ; TUNGSTEN CATALYZER ; DEVICE-QUALITY ; SOLAR-CELLS ; THIN-FILM
AbstractCatalytic chemical vapor deposition (Cat-CVD) has been demonstrated as a promising way to prepare device-quality silicon films. However, catalyst ageing due to Si contamination is an urgency to be solved for the practical application of the technique. In this study, the effect of carbonization of tantalum catalyst on its structure and performance was investigated. The carbonized Ta catalyst has a TaC surface layer which is preserved over the temperature range between 1450 and 1750 degrees C and no Si contamination occurs on the catalyst after long-term use. Si film prepared using the carbonized Ta catalyst has a similar crystal structure to that prepared by uncarbonized Ta catalyst. Formation of the TaC surface layer can alleviate the ageing problem of the catalyst, which shows great potential as a stable catalyst for Cat-CVD of Si films. (C) 2012 Published by Elsevier B.V.
Language英语
WOS IDWOS:000305719000008
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/117873
Collection中国科学院大连化学物理研究所
Corresponding AuthorLi C(李灿)
Affiliation1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China
2.Dalian Natl Lab Clean Energy, Dalian 116023, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
Recommended Citation
GB/T 7714
Cheng, Shimin,Gao, Huiping,Ren, Tong,et al. Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films[J]. THIN SOLID FILMS,2012,520(16):5155-5160.
APA Cheng, Shimin,Gao, Huiping,Ren, Tong,Ying, Pinliang,Li, Can,&李灿.(2012).Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films.THIN SOLID FILMS,520(16),5155-5160.
MLA Cheng, Shimin,et al."Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films".THIN SOLID FILMS 520.16(2012):5155-5160.
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