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学科主题物理化学
Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films
Cheng, Shimin1,2,3; Gao, Huiping1,2; Ren, Tong1,2; Ying, Pinliang1,2; Li, Can1,2; Li C(李灿)
关键词Silicon Thin Films Catalytic Chemical Vapor Deposition Carbonized Tantalum Catalyst Ageing X-ray Diffraction Raman Spectroscopy
刊名THIN SOLID FILMS
2012-06-01
DOI10.1016/j.tsf.2012.03.129
520期:16页:5155-5160
收录类别SCI
文章类型Article
部门归属5
项目归属503
产权排名1,1
WOS标题词Science & Technology ; Technology ; Physical Sciences
类目[WOS]Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
研究领域[WOS]Materials Science ; Physics
关键词[WOS]HOT-WIRE CVD ; HYDROGENATED AMORPHOUS-SILICON ; A-SI-H ; CAT-CVD ; POLYCRYSTALLINE SILICON ; DIAMOND DEPOSITION ; TUNGSTEN CATALYZER ; DEVICE-QUALITY ; SOLAR-CELLS ; THIN-FILM
英文摘要Catalytic chemical vapor deposition (Cat-CVD) has been demonstrated as a promising way to prepare device-quality silicon films. However, catalyst ageing due to Si contamination is an urgency to be solved for the practical application of the technique. In this study, the effect of carbonization of tantalum catalyst on its structure and performance was investigated. The carbonized Ta catalyst has a TaC surface layer which is preserved over the temperature range between 1450 and 1750 degrees C and no Si contamination occurs on the catalyst after long-term use. Si film prepared using the carbonized Ta catalyst has a similar crystal structure to that prepared by uncarbonized Ta catalyst. Formation of the TaC surface layer can alleviate the ageing problem of the catalyst, which shows great potential as a stable catalyst for Cat-CVD of Si films. (C) 2012 Published by Elsevier B.V.
语种英语
WOS记录号WOS:000305719000008
引用统计
被引频次:2[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/117873
专题中国科学院大连化学物理研究所
通讯作者Li C(李灿)
作者单位1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China
2.Dalian Natl Lab Clean Energy, Dalian 116023, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
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GB/T 7714
Cheng, Shimin,Gao, Huiping,Ren, Tong,et al. Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films[J]. THIN SOLID FILMS,2012,520(16):5155-5160.
APA Cheng, Shimin,Gao, Huiping,Ren, Tong,Ying, Pinliang,Li, Can,&李灿.(2012).Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films.THIN SOLID FILMS,520(16),5155-5160.
MLA Cheng, Shimin,et al."Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films".THIN SOLID FILMS 520.16(2012):5155-5160.
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