DICP OpenIR
Subject Area物理化学
Influence of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating:Experimental and simulation study
Min Zhang; Lei Liub; Xiaoxu Yanga; Feifei Xua; Chengsen Liua; Gong FQ(公发全)
Source PublicationSurface & Coatings Technology
2013
Volume226Pages:186
Cooperation Status
Department7
Funding Project703
Contribution Rank待补充
Funding Organization3,6 ; 3,6 ; 3,6 ; 3,6
AbstractInfluence of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating:Experimental and simulation study
Language
Funding Organization3,6 ; 3,6 ; 3,6 ; 3,6
URL查看原文
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/119337
Collection中国科学院大连化学物理研究所
Corresponding AuthorMin Zhang
Recommended Citation
GB/T 7714
Min Zhang,Lei Liub,Xiaoxu Yanga,et al. Influence of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating:Experimental and simulation study[J]. Surface & Coatings Technology,2013,226:186.
APA Min Zhang,Lei Liub,Xiaoxu Yanga,Feifei Xua,Chengsen Liua,&公发全.(2013).Influence of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating:Experimental and simulation study.Surface & Coatings Technology,226,186.
MLA Min Zhang,et al."Influence of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating:Experimental and simulation study".Surface & Coatings Technology 226(2013):186.
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