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题名: Freestanding silicon films formed on ionic liquid surfaces
作者: Cheng, Shimin1, 2, 3;  Hu, Linyan1, 2;  Qin, Wei1, 2, 3;  Xiong, Fengqiang1, 2, 3;  Li, Can1, 2
刊名: JOURNAL OF MATERIALS CHEMISTRY A
发表日期: 2013
DOI: 10.1039/c2ta00503d
卷: 1, 期:1, 页:55-58
收录类别: SCI
文章类型: Article
WOS标题词: Science & Technology ;  Physical Sciences ;  Technology
类目[WOS]: Chemistry, Physical ;  Energy & Fuels ;  Materials Science, Multidisciplinary
研究领域[WOS]: Chemistry ;  Energy & Fuels ;  Materials Science
英文摘要: Freestanding silicon films with a thickness ranging from 1 nm to several micrometers were prepared by Cat-CVD onto ionic liquid ([BMIM][BF4]) surfaces for the first time. The films, obtained without a solid substrate, can be facilely characterized by TEM and AFM to study the film formation and growth process.
关键词[WOS]: SPUTTER-DEPOSITION TECHNIQUE ;  CHEMICAL-VAPOR-DEPOSITION ;  SOLAR-CELLS ;  NANOPARTICLES ;  SOLVENTS ;  TELESCOPE
语种: 英语
WOS记录号: WOS:000314598400007
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/137516
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China
2.Dalian Natl Lab Clean Energy, Dalian 116023, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China

Recommended Citation:
Cheng, Shimin,Hu, Linyan,Qin, Wei,et al. Freestanding silicon films formed on ionic liquid surfaces[J]. JOURNAL OF MATERIALS CHEMISTRY A,2013,1(1):55-58.
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