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Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser
Zhang, Jiao1; Wang, Yanhui1; Duo, Liping2; Li, Guofu2; Wang, Dezhen1
刊名PHYSICS OF PLASMAS
2013-04-01
DOI10.1063/1.4802032
20期:4
收录类别SCI
文章类型Article
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Physics, Fluids & Plasmas
研究领域[WOS]Physics
关键词[WOS]PRESSURE ; HELIUM ; MODEL
英文摘要The pulsed discharge for producing iodine atoms from the alkyl and perfluoroalky iodides (CH3I, CF3I, etc.) is the most efficient method for achieving the pulse operating mode of a chemical oxygen-iodine laser. In this paper, a one-dimensional fluid model is developed to study the characteristics of pulsed discharge in CF3I-He mixture. By solving continuity equation, momentum equation, Poisson equation, Boltzmann equation, and an electric circuit equation, the temporal evolution of discharge current density and various discharge products, especially the atomic iodine, are investigated. The dependence of iodine atom density on discharge parameters is also studied. The results show that iodine atom density increases with the pulsed width and pulsed voltage amplitude. The mixture ratio of CF3I and helium plays a more significant role in iodine atom production. For a constant voltage amplitude, there exists an optimal mixture ratio under which the maximum iodine atom concentration is achieved. The bigger the applied voltage amplitude is, the higher partial pressure of CF3I is needed to obtain the maximum iodine atom concentration. (C) 2013 AIP Publishing LLC [http://dx.doi.org/10.1063/1.4802032]
语种英语
WOS记录号WOS:000318241900074
引用统计
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/137788
专题中国科学院大连化学物理研究所
作者单位1.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China
2.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116024, Peoples R China
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GB/T 7714
Zhang, Jiao,Wang, Yanhui,Duo, Liping,et al. Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser[J]. PHYSICS OF PLASMAS,2013,20(4).
APA Zhang, Jiao,Wang, Yanhui,Duo, Liping,Li, Guofu,&Wang, Dezhen.(2013).Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser.PHYSICS OF PLASMAS,20(4).
MLA Zhang, Jiao,et al."Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser".PHYSICS OF PLASMAS 20.4(2013).
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