DICP OpenIR
Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser
Zhang, Jiao1; Wang, Yanhui1; Duo, Liping2; Li, Guofu2; Wang, Dezhen1
Source PublicationPHYSICS OF PLASMAS
2013-04-01
DOI10.1063/1.4802032
Volume20Issue:4
Indexed BySCI
SubtypeArticle
WOS HeadingsScience & Technology ; Physical Sciences
WOS SubjectPhysics, Fluids & Plasmas
WOS Research AreaPhysics
WOS KeywordPRESSURE ; HELIUM ; MODEL
AbstractThe pulsed discharge for producing iodine atoms from the alkyl and perfluoroalky iodides (CH3I, CF3I, etc.) is the most efficient method for achieving the pulse operating mode of a chemical oxygen-iodine laser. In this paper, a one-dimensional fluid model is developed to study the characteristics of pulsed discharge in CF3I-He mixture. By solving continuity equation, momentum equation, Poisson equation, Boltzmann equation, and an electric circuit equation, the temporal evolution of discharge current density and various discharge products, especially the atomic iodine, are investigated. The dependence of iodine atom density on discharge parameters is also studied. The results show that iodine atom density increases with the pulsed width and pulsed voltage amplitude. The mixture ratio of CF3I and helium plays a more significant role in iodine atom production. For a constant voltage amplitude, there exists an optimal mixture ratio under which the maximum iodine atom concentration is achieved. The bigger the applied voltage amplitude is, the higher partial pressure of CF3I is needed to obtain the maximum iodine atom concentration. (C) 2013 AIP Publishing LLC [http://dx.doi.org/10.1063/1.4802032]
Language英语
WOS IDWOS:000318241900074
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/137788
Collection中国科学院大连化学物理研究所
Affiliation1.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China
2.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116024, Peoples R China
Recommended Citation
GB/T 7714
Zhang, Jiao,Wang, Yanhui,Duo, Liping,et al. Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser[J]. PHYSICS OF PLASMAS,2013,20(4).
APA Zhang, Jiao,Wang, Yanhui,Duo, Liping,Li, Guofu,&Wang, Dezhen.(2013).Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser.PHYSICS OF PLASMAS,20(4).
MLA Zhang, Jiao,et al."Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser".PHYSICS OF PLASMAS 20.4(2013).
Files in This Item:
There are no files associated with this item.
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Zhang, Jiao]'s Articles
[Wang, Yanhui]'s Articles
[Duo, Liping]'s Articles
Baidu academic
Similar articles in Baidu academic
[Zhang, Jiao]'s Articles
[Wang, Yanhui]'s Articles
[Duo, Liping]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Zhang, Jiao]'s Articles
[Wang, Yanhui]'s Articles
[Duo, Liping]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.