Formation of CN radical by DC discharge of CH3CN and LIF measurement
Tan, XF; Dong, F; Chen, H; Li, XC
KeywordCn Radical Laser Induced Fluorescence Molecular Beam Polarization Cold Cathode Dc Discharge
Indexed BySCI
WOS HeadingsScience & Technology ; Physical Sciences
WOS SubjectChemistry, Physical
WOS Research AreaChemistry
AbstractJet cooled CN radical beam was formed by cold cathode DC: discharge of CH3CN under molecular beam conditions. The cylindrical cold cathode was placed between the skimmer and the nozzle to prevent the nozzle from being clogged by carbon particles. The pulsed photon counting LIF measurement was seriously jeopardized by the high intensive scattering laser light due to CN(B(2)Sigma)'s short lifetime (70 ns) and weak fluorescence. By using an attenuator to reduce laser intensity or a polaroid to reduce the scattering laser intensity, we obtained LIP spectra with good S/N ratio. With the theoretical simulaed spectra, the effects of laser polarization on LIF were discussed and the relative populations of CN rotational and vibrational states were obtained.
WOS IDWOS:000075192400018
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Document Type期刊论文
AffiliationChinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China
Recommended Citation
GB/T 7714
Tan, XF,Dong, F,Chen, H,et al. Formation of CN radical by DC discharge of CH3CN and LIF measurement[J]. ACTA PHYSICO-CHIMICA SINICA,1998,14(7):664-668.
APA Tan, XF,Dong, F,Chen, H,&Li, XC.(1998).Formation of CN radical by DC discharge of CH3CN and LIF measurement.ACTA PHYSICO-CHIMICA SINICA,14(7),664-668.
MLA Tan, XF,et al."Formation of CN radical by DC discharge of CH3CN and LIF measurement".ACTA PHYSICO-CHIMICA SINICA 14.7(1998):664-668.
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