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Study on carbon deposition of CH4, C2H6 and C2H4 cracking over Ni-based catalysts
Yang, YL; Xu, HY; Li, WZ
KeywordMethane Ethane Ethylene Nickel Catalyst Metal-semiconductor Interaction
Source PublicationACTA PHYSICO-CHIMICA SINICA
2001-09-01
DOI10.3866/PKU.WHXB20010902
Volume17Issue:9Pages:773-775
Indexed BySCI
SubtypeArticle
WOS HeadingsScience & Technology ; Physical Sciences
WOS SubjectChemistry, Physical
WOS Research AreaChemistry
WOS KeywordMETHANE ; SELECTIVITY
AbstractInfluence of the additions of different type semiconductor oxides to Ni-based catalyst on the characteristics of carbon deposition of CH4, C2H6 and C2H4 cracking was studied by using pulse microreaction technique. It was discovered that, the addition of n-type semiconductor CeO2 to Ni catalyst would decrease carbon deposition activity of CH4 and C2H6 cracking, whereas the addition of p-type semiconductor Co3O4 would increase carbon deposition activity of CH4 and C2H6 cracking. On the other hand, the effect of semiconductor oxide additives on the characteristics of carbon deposition of C2H4 cracking is opposite to that of CH4 and C2H6 due to the different activated mechanism. XPS results reveal that there is a metal-semiconductor interaction (MScI) between active metal Ni and semiconductor oxide, which is the most important factor leads to the above phenomenon.
Language英语
WOS IDWOS:000171302100002
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/139023
Collection中国科学院大连化学物理研究所
AffiliationChinese Acad Sci, Dalian Inst Chem Phys, Dalian 116023, Peoples R China
Recommended Citation
GB/T 7714
Yang, YL,Xu, HY,Li, WZ. Study on carbon deposition of CH4, C2H6 and C2H4 cracking over Ni-based catalysts[J]. ACTA PHYSICO-CHIMICA SINICA,2001,17(9):773-775.
APA Yang, YL,Xu, HY,&Li, WZ.(2001).Study on carbon deposition of CH4, C2H6 and C2H4 cracking over Ni-based catalysts.ACTA PHYSICO-CHIMICA SINICA,17(9),773-775.
MLA Yang, YL,et al."Study on carbon deposition of CH4, C2H6 and C2H4 cracking over Ni-based catalysts".ACTA PHYSICO-CHIMICA SINICA 17.9(2001):773-775.
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