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题名: Influence of CeO2 and Co3O(4) promoters on carbon deposition and carbon elimination over Ni-based catalysts
作者: Yang, YL;  Li, WZ;  Xu, HY
关键词: metal-semiconductor interaction ;  nickel-based catalyst ;  cerium oxide ;  cobalt oxide ;  carbon deposition ;  carbon elimination
刊名: CHINESE JOURNAL OF CATALYSIS
发表日期: 2002-11-01
卷: 23, 期:6, 页:517-520
收录类别: SCI
文章类型: Article
WOS标题词: Science & Technology ;  Physical Sciences ;  Technology
类目[WOS]: Chemistry, Applied ;  Chemistry, Physical ;  Engineering, Chemical
研究领域[WOS]: Chemistry ;  Engineering
英文摘要: The influence of the addition of CeO2 or Co3O4 promoter on carbon deposition by CH4 and carbon elimination by CO2 over nickel-based catalysts was studied by using pulse reaction as well as BET, TGA, XPS, H-2-chemisorption and CO2-TPSR techniques. The addition of n-type semiconductor CeO2 decreased carbon deposition activity of CH4 and increased carbon elimination ability of CO2. However, the addition of Co3O4 improved carbon deposition by CH4 and. resisted carbon elimination by CO2. Compared with Ni/Al2O3 catalyst, the modified catalysts Ni/CeO2-Al2O3 and Ni/Co3O4-Al2O3 show no change in specific surface area and pore volume. Thereby, it should be considered that there is no any relation between the carbon. deposition or carbon elimination and the specific surface area or the pore volume of the catalysts. Also, the changes in particle size and metallic surface area by the adding of metal additives were not remarkable compared with Ni/Al2O3 catalyst. There is an interaction between active metal Ni and semiconductor oxide CeO2 and the addition of CeO2 can increase the d-electron density of active atom Ni, which would inhibit the migration of C-H a-electron from CH4 molecule to d-orbital of Ni atom, thus decreasing the amount of CH4 adsorbed on Ni sites and the extent of carbon deposition. On the contrary, in the case of CO2, the electron-rich character of Ni sites, which is strengthened by the addition of n-type semiconductor CeO2, is beneficial to CO2 adsorption, thus leading to an enhancement of carbon elimination. Metal-semiconductor interaction is the most important factor for the above phenomenon.
关键词[WOS]: SYNTHESIS GAS ;  PARTIAL OXIDATION ;  METHANE ;  DIOXIDE ;  SYNGAS ;  NI/ALPHA-AL2O3
语种: 英语
WOS记录号: WOS:000179903200010
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/139110
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116023, Peoples R China

Recommended Citation:
Yang, YL,Li, WZ,Xu, HY. Influence of CeO2 and Co3O(4) promoters on carbon deposition and carbon elimination over Ni-based catalysts[J]. CHINESE JOURNAL OF CATALYSIS,2002,23(6):517-520.
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