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题名: Studies on property of carbon deposition on Ni/CeO2-Al2O3 catalyst for CH4-CO2 reforming reaction
作者: Yang, YL;  Xu, HY;  Li, WZ
关键词: Ni/CeO2-Al2O3 catalyst ;  metal-semiconductor interaction ;  metal-support interaction ;  carbon deposition from CH4 ;  carbon elimination from CO2
刊名: CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE
发表日期: 2002-11-01
卷: 23, 期:11, 页:2112-2116
收录类别: SCI
文章类型: Article
WOS标题词: Science & Technology ;  Physical Sciences
类目[WOS]: Chemistry, Multidisciplinary
研究领域[WOS]: Chemistry
英文摘要: The influence of the addition of n-type semiconductor oxide CeO2 to Ni-based catalyst on carbon deposition from CH4 and carbon elimination by CO2 was studied by using a pulse microreaction technique. The, catalysts were characterized by TPR, XPS and hydrogen chemisorption. It was found that there was an interaction between active metal Ni and semiconductor oxide CeO2. The XPS data indicated that the addition of CeO2 could increase the d-electron density of active atom Ni, which would inhibit the migration of C-H sigma-electron from, CH4 molecule to d-orbital of Ni atom, therefore, the carbon deposition activity of CH4 decreases. Meanwhile, the migration of d-electron from Ni atom to empty antibond pi-orbital Of CO2 could be strengthened due to the addition-of n-type semiconductor CeO2, thereby, carbon elimination activity Of CO2 increases. As a result, the Ni/CeO2-Al2O3 catalyst has an excellent resistance to carbon deposition. In addition, the influence of the synergetic effect between SMSI and MScI on the resistance to carbon deposition of the catalysts calcined at various temperatures was investigated. It was discovered that, only in the presence of relatively weak metal-support interaction, it could exhibit the metal-semiconductor interaction (MScI).
关键词[WOS]: PARTIAL OXIDATION ;  SYNTHESIS GAS ;  METHANE ;  NI/AL2O3 ;  DIOXIDE ;  NICKEL ;  METALS
语种: 英语
WOS记录号: WOS:000179416200025
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/139235
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116023, Peoples R China

Recommended Citation:
Yang, YL,Xu, HY,Li, WZ. Studies on property of carbon deposition on Ni/CeO2-Al2O3 catalyst for CH4-CO2 reforming reaction[J]. CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE,2002,23(11):2112-2116.
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