DICP OpenIR
Studies on property of carbon deposition on Ni/CeO2-Al2O3 catalyst for CH4-CO2 reforming reaction
Yang, YL; Xu, HY; Li, WZ
KeywordNi/ceo2-al2o3 Catalyst Metal-semiconductor Interaction Metal-support Interaction Carbon Deposition From Ch4 Carbon Elimination From Co2
Source PublicationCHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE
2002-11-01
Volume23Issue:11Pages:2112-2116
Indexed BySCI
SubtypeArticle
WOS HeadingsScience & Technology ; Physical Sciences
WOS SubjectChemistry, Multidisciplinary
WOS Research AreaChemistry
WOS KeywordPARTIAL OXIDATION ; SYNTHESIS GAS ; METHANE ; NI/AL2O3 ; DIOXIDE ; NICKEL ; METALS
AbstractThe influence of the addition of n-type semiconductor oxide CeO2 to Ni-based catalyst on carbon deposition from CH4 and carbon elimination by CO2 was studied by using a pulse microreaction technique. The, catalysts were characterized by TPR, XPS and hydrogen chemisorption. It was found that there was an interaction between active metal Ni and semiconductor oxide CeO2. The XPS data indicated that the addition of CeO2 could increase the d-electron density of active atom Ni, which would inhibit the migration of C-H sigma-electron from, CH4 molecule to d-orbital of Ni atom, therefore, the carbon deposition activity of CH4 decreases. Meanwhile, the migration of d-electron from Ni atom to empty antibond pi-orbital Of CO2 could be strengthened due to the addition-of n-type semiconductor CeO2, thereby, carbon elimination activity Of CO2 increases. As a result, the Ni/CeO2-Al2O3 catalyst has an excellent resistance to carbon deposition. In addition, the influence of the synergetic effect between SMSI and MScI on the resistance to carbon deposition of the catalysts calcined at various temperatures was investigated. It was discovered that, only in the presence of relatively weak metal-support interaction, it could exhibit the metal-semiconductor interaction (MScI).
Language英语
WOS IDWOS:000179416200025
Citation statistics
Cited Times:5[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/139235
Collection中国科学院大连化学物理研究所
AffiliationChinese Acad Sci, Dalian Inst Chem Phys, Dalian 116023, Peoples R China
Recommended Citation
GB/T 7714
Yang, YL,Xu, HY,Li, WZ. Studies on property of carbon deposition on Ni/CeO2-Al2O3 catalyst for CH4-CO2 reforming reaction[J]. CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE,2002,23(11):2112-2116.
APA Yang, YL,Xu, HY,&Li, WZ.(2002).Studies on property of carbon deposition on Ni/CeO2-Al2O3 catalyst for CH4-CO2 reforming reaction.CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE,23(11),2112-2116.
MLA Yang, YL,et al."Studies on property of carbon deposition on Ni/CeO2-Al2O3 catalyst for CH4-CO2 reforming reaction".CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE 23.11(2002):2112-2116.
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