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Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma
Zhang, YJ; Yan, PX; Wu, ZG; Xu, JW; Zhang, WW; Li, X; Liu, WM; Xue, QJ
刊名JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2004-11-01
DOI10.1116/1.1807836
22期:6页:2419-2423
收录类别SCI
文章类型Article
WOS标题词Science & Technology ; Technology ; Physical Sciences
类目[WOS]Materials Science, Coatings & Films ; Physics, Applied
研究领域[WOS]Materials Science ; Physics
关键词[WOS]THIN-FILMS ; EVAPORATION ; DEPOSITION
英文摘要High-quality TiN films were successfully deposited on silicon and stainless-steel substrates at low temperature using an improved filtered cathode arc plasma technique developed in our lab. Atomic force microscope, x-ray diffractometer, x-ray photoelectron spectroscopy, and a nanoindenter were employed to characterize the TiN thin films. The microhardness of the TiN films have a high value up to 41 GPa. which is far higher than that of TiN Compounds deposited by conventional chemical vapor deposition and physical vapor deposition methods (20 Gpa or so). The films are of a stronger preferred crystalline orientation, very smooth surface, and high reflectivity. The effects of the negative substrate bias on the preferred crystalline orientation, surface roughness, deposition rate, and microhardness of Tin thin films are discussed in detail. (C) 2004 American Vacuum Society.
语种英语
WOS记录号WOS:000225505900035
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被引频次:6[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/139345
专题中国科学院大连化学物理研究所
作者单位1.Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Inst Chem Phys, State Key Lab Solia Lubricat, Lanzhou 730000, Peoples R China
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Zhang, YJ,Yan, PX,Wu, ZG,et al. Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2004,22(6):2419-2423.
APA Zhang, YJ.,Yan, PX.,Wu, ZG.,Xu, JW.,Zhang, WW.,...&Xue, QJ.(2004).Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,22(6),2419-2423.
MLA Zhang, YJ,et al."Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 22.6(2004):2419-2423.
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