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Deposition of high quality TiN thin films with nano-structure
Yan, PX; Wu, ZG; Xu, JW; Zhang, YJ; Zhang, WW; Liu, WM
关键词Tin Filtered Cathode Arc Plasma Nano-thin Films
刊名JOURNAL OF INORGANIC MATERIALS
2004-11-01
19期:6页:1386-1390
收录类别SCI
文章类型Article
WOS标题词Science & Technology ; Technology
类目[WOS]Materials Science, Ceramics
研究领域[WOS]Materials Science
关键词[WOS]PLASMA
英文摘要Nano-structure TiN thin films with excellent properties were deposited on the silicon wafer and stainless steel substrate under room temperature by a filtered cathode arc plasma technique. The structure and morphology of the films were characterized by atomic force microscopy (AFM) and small angle X-ray diffractometer (XRD), and it's hardness and elastic mouldness were measured by nano-indenter. Research results show that the TiN thin. films are highly uniform, very smooth, dense and droplet-phase-free. The average grain size of the films is 50nm, and it's hardness is up to 50GPa that is about two times of that deposited by conventional CVD and PVD techniques. XRD analysis demonstrates that the diffraction peaks of the TiN films move to small angle, and the films display a preferred orientation along plane (111).
语种英语
WOS记录号WOS:000225444000026
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被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/139477
专题中国科学院大连化学物理研究所
作者单位1.Lanzhou Univ, Inst Plasma & Met Mat, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Inst Chem Phys, State Key Lab Solid Lubr, Lanzhou 730000, Peoples R China
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Yan, PX,Wu, ZG,Xu, JW,et al. Deposition of high quality TiN thin films with nano-structure[J]. JOURNAL OF INORGANIC MATERIALS,2004,19(6):1386-1390.
APA Yan, PX,Wu, ZG,Xu, JW,Zhang, YJ,Zhang, WW,&Liu, WM.(2004).Deposition of high quality TiN thin films with nano-structure.JOURNAL OF INORGANIC MATERIALS,19(6),1386-1390.
MLA Yan, PX,et al."Deposition of high quality TiN thin films with nano-structure".JOURNAL OF INORGANIC MATERIALS 19.6(2004):1386-1390.
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