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Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma
Zhang, YJ; Yan, PX; Wu, ZG; Zhang, WW; Zhang, GA; Liu, WM; Xue, QJ
刊名PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
2005
DOI10.1002/pssa.200406902
202期:1页:95-101
收录类别SCI
文章类型Article
WOS标题词Science & Technology ; Technology ; Physical Sciences
类目[WOS]Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
研究领域[WOS]Materials Science ; Physics
关键词[WOS]TIN THIN-FILMS ; ENERGETIC CONDENSATION ; PREFERRED ORIENTATION ; STRAIN-ENERGY ; COATINGS ; STRESS ; MODEL
英文摘要High-quality titanium nitride (TiN) films with nano-structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in-plane "S" filter. The effects of substrate bias and argon flux on the crystal grain size, roughness and preferred orientation were systematically investigated. It was found that the substrate bias and argon flux can affect the properties of TiN films effectively. Transmission electron microscope images showed that the crystal grain size was uniform and ranged from 10 nm to 5 nm. The results of X-ray diffraction and electron diffraction indicated that the degree of preferred orientation was more evident under high substrate bias and high argon flux. (C) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
语种英语
WOS记录号WOS:000226541900011
引用统计
被引频次:13[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/139718
专题中国科学院大连化学物理研究所
作者单位1.Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
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Zhang, YJ,Yan, PX,Wu, ZG,et al. Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,2005,202(1):95-101.
APA Zhang, YJ.,Yan, PX.,Wu, ZG.,Zhang, WW.,Zhang, GA.,...&Xue, QJ.(2005).Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma.PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,202(1),95-101.
MLA Zhang, YJ,et al."Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma".PHYSICA STATUS SOLIDI A-APPLIED RESEARCH 202.1(2005):95-101.
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