DICP OpenIR
Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma
Zhang, YJ; Yan, PX; Wu, ZG; Zhang, WW; Zhang, GA; Liu, WM; Xue, QJ
Source PublicationPHYSICA STATUS SOLIDI A-APPLIED RESEARCH
2005
DOI10.1002/pssa.200406902
Volume202Issue:1Pages:95-101
Indexed BySCI
SubtypeArticle
WOS HeadingsScience & Technology ; Technology ; Physical Sciences
WOS SubjectMaterials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS Research AreaMaterials Science ; Physics
WOS KeywordTIN THIN-FILMS ; ENERGETIC CONDENSATION ; PREFERRED ORIENTATION ; STRAIN-ENERGY ; COATINGS ; STRESS ; MODEL
AbstractHigh-quality titanium nitride (TiN) films with nano-structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in-plane "S" filter. The effects of substrate bias and argon flux on the crystal grain size, roughness and preferred orientation were systematically investigated. It was found that the substrate bias and argon flux can affect the properties of TiN films effectively. Transmission electron microscope images showed that the crystal grain size was uniform and ranged from 10 nm to 5 nm. The results of X-ray diffraction and electron diffraction indicated that the degree of preferred orientation was more evident under high substrate bias and high argon flux. (C) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Language英语
WOS IDWOS:000226541900011
Citation statistics
Cited Times:13[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/139718
Collection中国科学院大连化学物理研究所
Affiliation1.Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
Recommended Citation
GB/T 7714
Zhang, YJ,Yan, PX,Wu, ZG,et al. Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,2005,202(1):95-101.
APA Zhang, YJ.,Yan, PX.,Wu, ZG.,Zhang, WW.,Zhang, GA.,...&Xue, QJ.(2005).Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma.PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,202(1),95-101.
MLA Zhang, YJ,et al."Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma".PHYSICA STATUS SOLIDI A-APPLIED RESEARCH 202.1(2005):95-101.
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