中国科学院大连化学物理研究所机构知识库
Advanced  
DICP OpenIR  > 中国科学院大连化学物理研究所  > 期刊论文
题名: Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma
作者: Zhang, YJ;  Yan, PX;  Wu, ZG;  Zhang, WW;  Zhang, GA;  Liu, WM;  Xue, QJ
刊名: PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
发表日期: 2005
DOI: 10.1002/pssa.200406902
卷: 202, 期:1, 页:95-101
收录类别: SCI
文章类型: Article
WOS标题词: Science & Technology ;  Technology ;  Physical Sciences
类目[WOS]: Materials Science, Multidisciplinary ;  Physics, Applied ;  Physics, Condensed Matter
研究领域[WOS]: Materials Science ;  Physics
英文摘要: High-quality titanium nitride (TiN) films with nano-structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in-plane "S" filter. The effects of substrate bias and argon flux on the crystal grain size, roughness and preferred orientation were systematically investigated. It was found that the substrate bias and argon flux can affect the properties of TiN films effectively. Transmission electron microscope images showed that the crystal grain size was uniform and ranged from 10 nm to 5 nm. The results of X-ray diffraction and electron diffraction indicated that the degree of preferred orientation was more evident under high substrate bias and high argon flux. (C) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
关键词[WOS]: TIN THIN-FILMS ;  ENERGETIC CONDENSATION ;  PREFERRED ORIENTATION ;  STRAIN-ENERGY ;  COATINGS ;  STRESS ;  MODEL
语种: 英语
WOS记录号: WOS:000226541900011
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/139718
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

Files in This Item:

There are no files associated with this item.


作者单位: 1.Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China
2.Chinese Acad Sci, Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China

Recommended Citation:
Zhang, YJ,Yan, PX,Wu, ZG,et al. Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,2005,202(1):95-101.
Service
 Recommend this item
 Sava as my favorate item
 Show this item's statistics
 Export Endnote File
Google Scholar
 Similar articles in Google Scholar
 [Zhang, YJ]'s Articles
 [Yan, PX]'s Articles
 [Wu, ZG]'s Articles
CSDL cross search
 Similar articles in CSDL Cross Search
 [Zhang, YJ]‘s Articles
 [Yan, PX]‘s Articles
 [Wu, ZG]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
  Add to CiteULike  Add to Connotea  Add to Del.icio.us  Add to Digg  Add to Reddit 
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Powered by CSpace