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Photoemission study of CCl(4) adsorption on Si(111)-7x7
Yao, Yunxi; Fu, Qiang; Tan, Dali; Bao, Xinhe
关键词X-ray Photoelectron Spectroscopy Ultraviolet Photoelectron Spectroscopy Chemisorption Silicon Solid-gas Interfaces Carbon Tetrachloride
刊名SURFACE SCIENCE
2008-07-01
DOI10.1016/j.susc.2008.04.043
602期:13页:2183-2188
收录类别SCI
文章类型Article
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Chemistry, Physical ; Physics, Condensed Matter
研究领域[WOS]Chemistry ; Physics
关键词[WOS]SCANNING-TUNNELING-MICROSCOPY ; SYNCHROTRON-RADIATION ; SURFACE-CHEMISTRY ; OXYGEN-ADSORPTION ; SITE SELECTIVITY ; CL ADSORPTION ; DISSOCIATION ; DESORPTION ; HYDROGEN ; CHEMISORPTION
英文摘要Adsorption of carbon tetrachloride (CCl(4)) on Si(111)-7 x 7 at room temperature (RT) and low temperature (LT) was investigated by X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). it was demonstrated that at RT CCl(4) dissociates on the Si(111)-7 x 7 surface leaving the surface extensively adsorbed with atomic Cl species. The dissociated Cl shows site preference to Si restatoms resulting in quick extinction of dangling bonds at the Si restatoms. At LT (around 120 K), both molecular and dissociative adsorption of CCl(4) occurs, which produces Cl, CCl(x) (x <= 3), and CCl(4) on the surface. The dangling bonds at the restatoms and adatoms were simultaneously quenched upon the LT CCl(4) adsorption. The site selectivity of restatoms to adatoms for molecule adsorption on the Si(l 11)-7 x 7 surface is discussed. (C) 2008 Elsevier B.V. All rights reserved.
语种英语
WOS记录号WOS:000257837500011
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被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/141046
专题中国科学院大连化学物理研究所
作者单位Chinese Acad Sci, State Key Lab Catalysis, Dalian Inst Chem Phys, Dalian 116023, Peoples R China
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Yao, Yunxi,Fu, Qiang,Tan, Dali,et al. Photoemission study of CCl(4) adsorption on Si(111)-7x7[J]. SURFACE SCIENCE,2008,602(13):2183-2188.
APA Yao, Yunxi,Fu, Qiang,Tan, Dali,&Bao, Xinhe.(2008).Photoemission study of CCl(4) adsorption on Si(111)-7x7.SURFACE SCIENCE,602(13),2183-2188.
MLA Yao, Yunxi,et al."Photoemission study of CCl(4) adsorption on Si(111)-7x7".SURFACE SCIENCE 602.13(2008):2183-2188.
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