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题名: A comparative study of CCl4 reactions on Ag and Si surfaces by in situ ultraviolet photoemission electron microscopy
作者: Yao, Yunxi1;  Fu, Qiang1;  Tan, Dali1;  Bao, Xinhe1
刊名: JOURNAL OF PHYSICS-CONDENSED MATTER
发表日期: 2009-08-05
DOI: 10.1088/0953-8984/21/31/314014
卷: 21, 期:31
收录类别: SCI ;  ISTP
文章类型: Article
WOS标题词: Science & Technology ;  Physical Sciences
类目[WOS]: Physics, Condensed Matter
研究领域[WOS]: Physics
英文摘要: The reactivity of a bulk Ag surface, an Ag monolayer film on Si(111)-7 x 7 (denoted as the root 3 x root 3-Ag-Si surface), and Si(111)-7 x 7 to CCl4 was investigated by x-ray photoelectron spectroscopy (XPS) and ultraviolet photoemission electron microscopy (UV-PEEM). In situ UV-PEEM was used to monitor simultaneously the CCl4 dissociation on different surface domains, including the bulk Ag, root 3 x root 3-Ag-Si, and Si(111). The PEEM results combined with XPS data show that CCl4 adsorbs dissociatively on bulk Ag(111) and Si(111) but adsorbs molecularly on the root 3 x root 3-Ag-Si surface, and the surface reactivity follows the order of Si(111) > Ag(111) > root 3 x root 3-Ag-Si.
关键词[WOS]: ADSORPTION ;  TURBULENCE ;  OXIDATION ;  EMISSION ;  DYNAMICS ;  AG(111) ;  METALS ;  GROWTH
语种: 英语
WOS记录号: WOS:000267880300015
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/141505
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Chinese Acad Sci, State Key Lab Catalysis, Dalian Inst Chem Phys, Dalian 116023, Peoples R China

Recommended Citation:
Yao, Yunxi,Fu, Qiang,Tan, Dali,et al. A comparative study of CCl4 reactions on Ag and Si surfaces by in situ ultraviolet photoemission electron microscopy[J]. JOURNAL OF PHYSICS-CONDENSED MATTER,2009,21(31).
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