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Femtosecond Photoelectron Imaging of N-2 at 410 nm
Guo, Wei1; Wei, Shanshan1; Lu, Xingqiang2; Wang, Li3
关键词Two-step Model Rydberg States Ponderomotive Potential Resonant/nonresonant Population Transfer
刊名BULLETIN OF THE KOREAN CHEMICAL SOCIETY
2010-12-20
DOI10.5012/bkcs.2010.31.12.3693
31期:12页:3693-3696
收录类别SCI
文章类型Article
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Chemistry, Multidisciplinary
研究领域[WOS]Chemistry
关键词[WOS]PULSE MULTIPHOTON IONIZATION ; ABOVE-THRESHOLD IONIZATION ; DYNAMICS ; ELECTRONS ; FIELDS ; STATES ; XENON ; ARGON
英文摘要We experimentally measure the kinetic energy and angular distributions of photoelectrons of N-2 as a function of 410 nm femtosecond laser intensity by using velocity map imaging technique. The strong-field multiphoton ionization of molecules shares many of the characteristics with those of atoms. Electron kinetic energies are nearly independent of laser intensities. The independence suggests that the electron peaks in the photoelectron spectrum actually result from a two-step process, indicative of the occurrence of real population in the intermediate states. The relative amplitudes of electron peaks indicate that in the two-step process, nonresonant population transfer dominates for low intensities, while resonant population transfer dominates for higher intensities.
语种英语
WOS记录号WOS:000286150900037
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文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/141918
专题中国科学院大连化学物理研究所
作者单位1.Univ S China, Sch Elect Engn, Hengyang 421001, Peoples R China
2.Univ S China, Sch Nucl Sci & Technol, Hengyang 421001, Peoples R China
3.Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China
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Guo, Wei,Wei, Shanshan,Lu, Xingqiang,et al. Femtosecond Photoelectron Imaging of N-2 at 410 nm[J]. BULLETIN OF THE KOREAN CHEMICAL SOCIETY,2010,31(12):3693-3696.
APA Guo, Wei,Wei, Shanshan,Lu, Xingqiang,&Wang, Li.(2010).Femtosecond Photoelectron Imaging of N-2 at 410 nm.BULLETIN OF THE KOREAN CHEMICAL SOCIETY,31(12),3693-3696.
MLA Guo, Wei,et al."Femtosecond Photoelectron Imaging of N-2 at 410 nm".BULLETIN OF THE KOREAN CHEMICAL SOCIETY 31.12(2010):3693-3696.
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