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题名: Laser induced photoelectron impact ionization in multiphoton ionization process
作者: Wang, L;  Li, HY;  Bai, JL;  Dai, DX;  Sun, JL;  Lu, RC
刊名: CHINESE CHEMICAL LETTERS
发表日期: 1997-11-01
卷: 8, 期:11, 页:1007-1010
收录类别: SCI
文章类型: Article
WOS标题词: Science & Technology ;  Physical Sciences
类目[WOS]: Chemistry, Multidisciplinary
研究领域[WOS]: Chemistry
英文摘要: Multiply charged ions of Ar and NO were observed in MPI experiment of NO/Ar with TOF-MS. A delayable pulsed acceleration field uas applied to investigate the effect of the photoelectrons on the formation of the multiply charged ions. The multiply charged ions were suggested to be produced by photoelectron impact ionization, in the region between the extractor grid and the repeller plate, step by step, from neutral species and lower charged ions. The 50-60ns of FWHM of the ion peaks implies that the pulse width of the photoelectrons should be shorter considering the broadening effect during the ionization process.
语种: 英语
WOS记录号: WOS:000071217200025
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/142811
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Acad Sinica, Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China

Recommended Citation:
Wang, L,Li, HY,Bai, JL,et al. Laser induced photoelectron impact ionization in multiphoton ionization process[J]. CHINESE CHEMICAL LETTERS,1997,8(11):1007-1010.
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