DICP OpenIR
Subject Area物理化学
欠氧化气氛下等离子体辅助脉冲直流磁控溅射高纯度Al2O3薄膜
李刚; 吕起鹏; 公发权; 王锋; 孙龙; 金玉奇
Source Publication真空科学与技术学报
2014-12-23
Volume34Issue:3Pages:261
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/143998
Collection中国科学院大连化学物理研究所
Corresponding Author李刚
Affiliation大连化学物理研究所
Recommended Citation
GB/T 7714
李刚,吕起鹏,公发权,等. 欠氧化气氛下等离子体辅助脉冲直流磁控溅射高纯度Al2O3薄膜[J]. 真空科学与技术学报,2014,34(3):261.
APA 李刚,吕起鹏,公发权,王锋,孙龙,&金玉奇.(2014).欠氧化气氛下等离子体辅助脉冲直流磁控溅射高纯度Al2O3薄膜.真空科学与技术学报,34(3),261.
MLA 李刚,et al."欠氧化气氛下等离子体辅助脉冲直流磁控溅射高纯度Al2O3薄膜".真空科学与技术学报 34.3(2014):261.
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20144IMSa9yY1u.PDF(483KB)期刊论文作者接受稿开放获取CC BY-NC-SAApplication Full Text
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