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Alternating precursor layer deposition for highly stable perovskite films towards efficient solar cells using vacuum deposition
Yang, Dong1; Yang, Zhou1; Qin, Wei2; Zhang, Yuliang2; Liu, Shengzhong (Frank)1,2; Li, Can2
刊名JOURNAL OF MATERIALS CHEMISTRY A
2015
DOI10.1039/c5ta01824b
3期:18页:9401-9405
收录类别SCI
文章类型Article
WOS标题词Science & Technology ; Physical Sciences ; Technology
类目[WOS]Chemistry, Physical ; Energy & Fuels ; Materials Science, Multidisciplinary
研究领域[WOS]Chemistry ; Energy & Fuels ; Materials Science
关键词[WOS]HOLE-CONDUCTOR-FREE ; HALIDE PEROVSKITES ; CH3NH3PBI3 ; INTERFACE ; TIO2
英文摘要An effective technique is developed to fabricate perovskite solar cells using alternating layer-by-layer vacuum deposition. The average efficiency of the planar device is 15.37% with a minimal standard deviation of +/- 0.37% and the best efficiency as high as 16.03%. Moreover, the device shows very good stability over 62 days with very little degradation <9% when stored under ambient conditions.
语种英语
WOS记录号WOS:000353927500006
引用统计
被引频次:59[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/146228
专题中国科学院大连化学物理研究所
作者单位1.Shaanxi Normal Univ, Key Lab Appl Surface & Colloid Chem, Natl Minist Educ, Inst Adv Energy Mat,Sch Mat Sci & Engn, Xian 710119, Peoples R China
2.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian Natl Lab Clean Energy, State Key Lab Catalysis, Dalian 116023, Peoples R China
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GB/T 7714
Yang, Dong,Yang, Zhou,Qin, Wei,et al. Alternating precursor layer deposition for highly stable perovskite films towards efficient solar cells using vacuum deposition[J]. JOURNAL OF MATERIALS CHEMISTRY A,2015,3(18):9401-9405.
APA Yang, Dong,Yang, Zhou,Qin, Wei,Zhang, Yuliang,Liu, Shengzhong ,&Li, Can.(2015).Alternating precursor layer deposition for highly stable perovskite films towards efficient solar cells using vacuum deposition.JOURNAL OF MATERIALS CHEMISTRY A,3(18),9401-9405.
MLA Yang, Dong,et al."Alternating precursor layer deposition for highly stable perovskite films towards efficient solar cells using vacuum deposition".JOURNAL OF MATERIALS CHEMISTRY A 3.18(2015):9401-9405.
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