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题名: Resolution deterioration in emission electron microscopy due to object roughness
作者: Nepijko, SA;  Sedov, NN;  Schonhense, G;  Escher, M;  Bao, XH;  Huang, WX
关键词: emission electron microscope (EEM) ;  resolution ;  object roughness ;  computer simulation
刊名: ANNALEN DER PHYSIK
发表日期: 2000
卷: 9, 期:6, 页:441-451
收录类别: SCI
文章类型: Article
部门归属: 5
项目归属: 502
WOS标题词: Science & Technology ;  Physical Sciences
类目[WOS]: Physics, Multidisciplinary
研究领域[WOS]: Physics
英文摘要: In the present paper a general analytic expression has been obtained and confirmed by a computer simulation which links the surface roughness of an object under study in an emission electron microscope and it's resolution. A quantitative derivation was made for the model case when there is a step on the object surface. It was shown that the resolution is deteriorated asymmetrically relative to the step. The effect sets a practical limit to the ultimate lateral resolution obtainable in an emission electron microscope.
关键词[WOS]: PEEM
语种: 英语
原文出处: 查看原文
WOS记录号: WOS:000088049100002
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/85051
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Natl Acad Sci Ukraine, Inst Phys, UA-03650 Kiev, Ukraine
2.Moscow Mil Inst, Moscow 109380, Russia
3.Univ Mainz, Inst Phys, D-55099 Mainz, Germany
4.Focus GmbH, D-65510 Hunstetten Gorsroth, Germany
5.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116023, Peoples R China

Recommended Citation:
Nepijko, SA,Sedov, NN,Schonhense, G,et al. Resolution deterioration in emission electron microscopy due to object roughness[J]. ANNALEN DER PHYSIK,2000,9(6):441-451.
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