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The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane
Li, YM; Sun, JL; Han, KL; He, GZ; Li, ZJ; Han KL(韩克利); Han KL(韩克利)
刊名CHEMICAL PHYSICS LETTERS
2006-04-03
DOI10.1016/j.cplett.2006.01.055
421期:1-3页:232-236
收录类别SCI
文章类型Article
部门归属11
项目归属1101
产权排名1;1
WOS标题词Science & Technology ; Physical Sciences
类目[WOS]Chemistry, Physical ; Physics, Atomic, Molecular & Chemical
研究领域[WOS]Chemistry ; Physics
关键词[WOS]PHOTO-DISSOCIATION ; MOLECULAR-BEAM ; MULTIPHOTON DISSOCIATION ; NITROMETHANE ; DECOMPOSITION ; NITROBENZENE ; PATHWAYS ; 2-NITROPROPANE ; NITROCOMPOUNDS ; CH3NO2
英文摘要Photodissociation of gaseous nitroethane at 266 am has been studied by monitoring the NO((XII)-I-2) product using laser-induced fluorescence technique. Rotational state distributions of the NO(XZII(1/2) and (XII1/2)-I-2, v" = 0) photofragment have been measured and characterized by Boltzmann temperature of 810 +/- 100 K. Only the NO photoproduct in v" = 0 state can be observed in the present work. The geometries of the nitroethane, the ethyl nitrite and the transition state connecting the two isomeric structures have been investigated using ab initio method. The photodissociation dynamics of nitroethane is discussed on the basis of experimental observation and calculation results. (c) 2006 Elsevier B.V. All rights reserved.
语种英语
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WOS记录号WOS:000236662600046
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被引频次:4[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://cas-ir.dicp.ac.cn/handle/321008/97309
专题中国科学院大连化学物理研究所
通讯作者Han KL(韩克利); Han KL(韩克利)
作者单位1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China
2.Calif State Univ Fullerton, Dept Chem & Biochem, Fullerton, CA 92834 USA
3.Dalian Jiaotong Univ, Coll Environm Sci & Engn, Dept Appl Chem, Liaoning 116028, Peoples R China
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GB/T 7714
Li, YM,Sun, JL,Han, KL,et al. The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane[J]. CHEMICAL PHYSICS LETTERS,2006,421(1-3):232-236.
APA Li, YM.,Sun, JL.,Han, KL.,He, GZ.,Li, ZJ.,...&韩克利.(2006).The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane.CHEMICAL PHYSICS LETTERS,421(1-3),232-236.
MLA Li, YM,et al."The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane".CHEMICAL PHYSICS LETTERS 421.1-3(2006):232-236.
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