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The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane
Li, YM; Sun, JL; Han, KL; He, GZ; Li, ZJ; Han KL(韩克利); Han KL(韩克利)
Source PublicationCHEMICAL PHYSICS LETTERS
2006-04-03
DOI10.1016/j.cplett.2006.01.055
Volume421Issue:1-3Pages:232-236
Indexed BySCI
SubtypeArticle
Department11
Funding Project1101
Contribution Rank1;1
WOS HeadingsScience & Technology ; Physical Sciences
WOS SubjectChemistry, Physical ; Physics, Atomic, Molecular & Chemical
WOS Research AreaChemistry ; Physics
WOS KeywordPHOTO-DISSOCIATION ; MOLECULAR-BEAM ; MULTIPHOTON DISSOCIATION ; NITROMETHANE ; DECOMPOSITION ; NITROBENZENE ; PATHWAYS ; 2-NITROPROPANE ; NITROCOMPOUNDS ; CH3NO2
AbstractPhotodissociation of gaseous nitroethane at 266 am has been studied by monitoring the NO((XII)-I-2) product using laser-induced fluorescence technique. Rotational state distributions of the NO(XZII(1/2) and (XII1/2)-I-2, v" = 0) photofragment have been measured and characterized by Boltzmann temperature of 810 +/- 100 K. Only the NO photoproduct in v" = 0 state can be observed in the present work. The geometries of the nitroethane, the ethyl nitrite and the transition state connecting the two isomeric structures have been investigated using ab initio method. The photodissociation dynamics of nitroethane is discussed on the basis of experimental observation and calculation results. (c) 2006 Elsevier B.V. All rights reserved.
Language英语
URL查看原文
WOS IDWOS:000236662600046
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Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://cas-ir.dicp.ac.cn/handle/321008/97309
Collection中国科学院大连化学物理研究所
Corresponding AuthorHan KL(韩克利); Han KL(韩克利)
Affiliation1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China
2.Calif State Univ Fullerton, Dept Chem & Biochem, Fullerton, CA 92834 USA
3.Dalian Jiaotong Univ, Coll Environm Sci & Engn, Dept Appl Chem, Liaoning 116028, Peoples R China
Recommended Citation
GB/T 7714
Li, YM,Sun, JL,Han, KL,et al. The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane[J]. CHEMICAL PHYSICS LETTERS,2006,421(1-3):232-236.
APA Li, YM.,Sun, JL.,Han, KL.,He, GZ.,Li, ZJ.,...&韩克利.(2006).The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane.CHEMICAL PHYSICS LETTERS,421(1-3),232-236.
MLA Li, YM,et al."The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane".CHEMICAL PHYSICS LETTERS 421.1-3(2006):232-236.
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