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题名: The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane
作者: Li, YM;  Sun, JL;  Han, KL;  He, GZ;  Li, ZJ
通讯作者: 韩克利
刊名: CHEMICAL PHYSICS LETTERS
发表日期: 2006-04-03
DOI: 10.1016/j.cplett.2006.01.055
卷: 421, 期:1-3, 页:232-236
收录类别: SCI
文章类型: Article
部门归属: 11
项目归属: 1101
产权排名: 1;1
WOS标题词: Science & Technology ;  Physical Sciences
类目[WOS]: Chemistry, Physical ;  Physics, Atomic, Molecular & Chemical
研究领域[WOS]: Chemistry ;  Physics
英文摘要: Photodissociation of gaseous nitroethane at 266 am has been studied by monitoring the NO((XII)-I-2) product using laser-induced fluorescence technique. Rotational state distributions of the NO(XZII(1/2) and (XII1/2)-I-2, v" = 0) photofragment have been measured and characterized by Boltzmann temperature of 810 +/- 100 K. Only the NO photoproduct in v" = 0 state can be observed in the present work. The geometries of the nitroethane, the ethyl nitrite and the transition state connecting the two isomeric structures have been investigated using ab initio method. The photodissociation dynamics of nitroethane is discussed on the basis of experimental observation and calculation results. (c) 2006 Elsevier B.V. All rights reserved.
关键词[WOS]: PHOTO-DISSOCIATION ;  MOLECULAR-BEAM ;  MULTIPHOTON DISSOCIATION ;  NITROMETHANE ;  DECOMPOSITION ;  NITROBENZENE ;  PATHWAYS ;  2-NITROPROPANE ;  NITROCOMPOUNDS ;  CH3NO2
语种: 英语
原文出处: 查看原文
WOS记录号: WOS:000236662600046
Citation statistics: 
内容类型: 期刊论文
URI标识: http://cas-ir.dicp.ac.cn/handle/321008/97309
Appears in Collections:中国科学院大连化学物理研究所_期刊论文

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作者单位: 1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China
2.Calif State Univ Fullerton, Dept Chem & Biochem, Fullerton, CA 92834 USA
3.Dalian Jiaotong Univ, Coll Environm Sci & Engn, Dept Appl Chem, Liaoning 116028, Peoples R China

Recommended Citation:
Li, YM,Sun, JL,Han, KL,et al. The dynamics of NO radical formation in the UV 266 nm photodissociation of nitroethane[J]. CHEMICAL PHYSICS LETTERS,2006,421(1-3):232-236.
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