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Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma 期刊论文
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 2005, 卷号: 202, 期号: 1, 页码: 95-101
Authors:  Zhang, YJ;  Yan, PX;  Wu, ZG;  Zhang, WW;  Zhang, GA;  Liu, WM;  Xue, QJ
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