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Interface chemistry and surface morphology evolution study for InAs/Al2O3 stacks upon in situ ultrahigh vacuum annealing 期刊论文
APPLIED SURFACE SCIENCE, 2018, 卷号: 443, 页码: 567-574
Authors:  Wang, Xinglu;  Qin, Xiaoye;  Wang, Wen;  Liu, Yue;  Shi, Xiaoran;  Sun, Yong;  Liu, Chen;  Zhao, Jiali;  Zhang, Guanhua;  Liu, Hui;  Cho, Kyeongjae;  Wu, Rui;  Wang, Jiaou;  Zhang, Sen;  Wallace, Robert M.;  Dong, Hong
Favorite  |  View/Download:13/0  |  Submit date:2019/06/20
Elemental Diffusion  Surface Morphology  High-k Dielectrics  Inas  Thermal Stability